CAICISS Chamber
The main chamber on the CAICISS system includes not only a port to facilitate the ion scattering, but also a range of surface preparation techniques including ion bombardment (1-5 keV) & annealing up to 800 celcius. The chamber can also be fitted with a gas cracker for atomic hydrogen cleaning, knudsen cells or other deposition sources.
In addition to CAICISS, three other surface science techniques are included in the chamber's makeup. Details on LEED, XPS and Auger electron spectroscopy can be found elsewhere on this site.
Update (Oct 2010):
A new fast entry chamber has been added to the system where the Pt source used to reside. This allows us to change samples without having to break the vacuum in the scattering chamber, reducing the sample turnaround time from 1 week to a few hours.
A schematic of the chamber arrangement used during the investigation of Pt deposition on oxygen-covered nickel surfaces.
A top-down view of the main chamber.
A side-on view of the system with the ion source on the left and the main chamber on the right.
